Model of coating and drying process for flat polymer film fabrication

Hiroyuki Kagami; Ryuji Miyagawa; Atsushi Kawata; Daisuke Nakashima; Shinji Kobayashi; Takahiro Kitano; Kazuhiro Takeshita; Hiroshi Kubota; Tadahiro Ohmi

doi:10.1117/12.476948

1 August 2002 Model of coating and drying process for flat polymer film fabrication

Hiroyuki Kagami, Ryuji Miyagawa, Atsushi Kawata, Daisuke Nakashima, Shinji Kobayashi, Takahiro Kitano, Kazuhiro Takeshita, Hiroshi Kubota, Tadahiro Ohmi

Author Affiliations +

Proceedings Volume 4754, Photomask and Next-Generation Lithography Mask Technology IX; (2002) https://doi.org/10.1117/12.476948
Event: Photomask and Next Generation Lithography Mask Technology IX, 2002, Yokohama, Japan

Abstract

The coating procedure of polymer solutions by the scanning technique is developed for LSI technologies at the next generation, where a polymer solution as resists and inter-layer dielectric films is coated on a flat substrate, and then only the solvent is vaporized and removed, and finally the thin film is remaining there. In case of applying to the photo-lithography process, scan coating and its drying processes work together for astonishing flatness in 1% fluctuation range. When the coated polymer solution is dried under reduced pressure or vacuum, the thickness distribution of the resultant film should be accurately prospected and controlled by parameters. The film thickness is generally thicker at the edge and thinner inside from there than the average thickness. A typical thickness profile of a resist film is shown in Figure 1 . The phenomena are always observed, but have not been analyzed numerically. In this paper, we report a numerical model of the drying process of liquid film including polymers and give the essential parameters to the coating and drying processes. The parameters are focused on a vaporization rate, diffusion coefficients, coated solution thickness and intrinsic viscosity, which were calculated by simplified dynamical models of Langmuir's vaporization rate equation and Einstein relation at complex polymer solutions.

Citation Download Citation

Hiroyuki Kagami, Ryuji Miyagawa, Atsushi Kawata, Daisuke Nakashima, Shinji Kobayashi, Takahiro Kitano, Kazuhiro Takeshita, Hiroshi Kubota, and Tadahiro Ohmi "Model of coating and drying process for flat polymer film fabrication", Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); https://doi.org/10.1117/12.476948

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available