1 August 2002 NEGATIVE-CAR blanks feasibility study results for EB reticle fabrication beyond 100-nm node
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Proceedings Volume 4754, Photomask and Next-Generation Lithography Mask Technology IX; (2002) https://doi.org/10.1117/12.476945
Event: Photomask and Next Generation Lithography Mask Technology IX, 2002, Yokohama, Japan
Abstract
A negative-CAR for EB reticle fabrication beyond 100 nm node is needed, which is superior in performance such as resolution, sensitivity, pattern quality, CD movement by process delays (PCD, PED) and process latitudes. We started preliminary screening on negative-CARs, and more than 10 resists out of 3 suppliers were examined including some that were still under development. Then, three CARs (A-2, B-1 and C-3) was selected as candidates, and those candidates were evaluated in 'resolution and sensitivity', 'pattern quality', 'CD movement due to process delays' and 'process latitudes'. B-1 turned out to be the best choice in total performance. In addition, thinning coating thickness was investigated for resolution improvement. A negative-CAR for EB reticle fabrication beyond 100 nm node is needed, which is superior in performance such as resolution, sensitivity, pattern quality, CD movement by process delays (PCD, PED) and process latitudes. We started preliminary screening on negative-CARs, and more than 10 resists out of 3 suppliers were examined including some that were still under development. Then, three CARs (A-2, B-1 and C-3) was selected as candidates, and those candidates were evaluated in 'resolution and sensitivity', 'pattern quality', 'CD movement due to process delays' and 'process latitudes'. B-1 turned out to be the best choice in total performance. In addition, thinning coating thickness was investigated for resolution improvement.
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Fumiko Ota, Masahiro Hashimoto, Keishi Asakawa, Takao Higuchi, Yasunori Yokoya, "NEGATIVE-CAR blanks feasibility study results for EB reticle fabrication beyond 100-nm node", Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476945; https://doi.org/10.1117/12.476945
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