1 August 2002 Phase assignment for bright field of dense contact
Author Affiliations +
Proceedings Volume 4754, Photomask and Next-Generation Lithography Mask Technology IX; (2002) https://doi.org/10.1117/12.476940
Event: Photomask and Next Generation Lithography Mask Technology IX, 2002, Yokohama, Japan
Abstract
There is a simple algorithm to translate the dense contacts of a regular design into a well assigned two phases in this paper. Some of its basic variant applications and a procedure to detect the phase assignment errors for the whole chip layer to insure the whole chip phase assignment success are also included. The variant applications include to add the assist features and assign the phases between the main features and the assist features and the post rule bias consideration. This executable environment makes the alternating PSM easy to be applied in the bright field of the dense contact.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nail Tang, "Phase assignment for bright field of dense contact", Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476940; https://doi.org/10.1117/12.476940
PROCEEDINGS
8 PAGES


SHARE
Back to Top