1 August 2002 Simulation method using the image filter method
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Proceedings Volume 4754, Photomask and Next-Generation Lithography Mask Technology IX; (2002) https://doi.org/10.1117/12.476938
Event: Photomask and Next Generation Lithography Mask Technology IX, 2002, Yokohama, Japan
Abstract
We conducted an experiment to determine if the use of image filter method for simulation that calculates the distribution of light intensity on a wafer can reduce processing time in comparison to the use of the Fourier transform. The image filter table value is set by changing the value of Gaussian distribution. The image filter method was approximated with the light intensity of optical simulation that keeps accuracy within the range of the allowance. In this experiment, we examined the differences between the distributions calculated using the Fourier transform and the calculation time by varying the sizes of the image filter tables. For the experiment, we used pattern data having a line width that used in the most advanced technology. When the area of pattern data was wide, the experiment revealed that use of the image filter method reduced calculation time by approximately 50 percent or more in comparison to a simulation that used the Fourier transform. As we decreased the size of the image filter tables, the calculation time became shorter, but the differences from the distribution calculated using the Fourier transform became larger. We intend to study the possibility of simulation by expanding the area of pattern data and using the image filter method for simulation-based OPC.
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Masahiko Minemura, Kazuhiko Takahashi, Mitsuo Sakurai, Kazuya Sugawa, "Simulation method using the image filter method", Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476938; https://doi.org/10.1117/12.476938
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