19 April 2002 Fractional Fourier domain filtering applied to improve image quality in photolithography
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Proceedings Volume 4755, Design, Test, Integration, and Packaging of MEMS/MOEMS 2002; (2002) https://doi.org/10.1117/12.462880
Event: Symposium on Design, Test, Integration, and Packaging of MEMS/MOEMS 2002, 2002, Cannes-Mandelieu, France
Abstract
In this paper, we present a new method to improve the image quality and resolution of photolithography by filtering in fractional Fourier domain. Introducing a filter into fractional Fourier domain can not only increase the flexibility of the filtering operation, but also enhance the image quality and the depth of focus in photolithography. The corresponding simulation results are illustrated.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yixiao Zhang, Yixiao Zhang, Jinglei Du, Jinglei Du, Jingguo Yang, Jingguo Yang, Yangsu Zeng, Yangsu Zeng, Yongkang Guo, Yongkang Guo, Zheng Cui, Zheng Cui, Jun Yao, Jun Yao, } "Fractional Fourier domain filtering applied to improve image quality in photolithography", Proc. SPIE 4755, Design, Test, Integration, and Packaging of MEMS/MOEMS 2002, (19 April 2002); doi: 10.1117/12.462880; https://doi.org/10.1117/12.462880
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