Parametric yield optimization of MEMS

Flavien Delauche; Bachar Affour; Christian Dufaza

doi:10.1117/12.462802

19 April 2002 Parametric yield optimization of MEMS

Flavien Delauche, Bachar Affour, Christian Dufaza

Proceedings Volume 4755, Design, Test, Integration, and Packaging of MEMS/MOEMS 2002; (2002) https://doi.org/10.1117/12.462802
Event: Symposium on Design, Test, Integration, and Packaging of MEMS/MOEMS 2002, 2002, Cannes-Mandelieu, France

Abstract

High volume ICs production companies show a growing interest in MEMS components. Telecom MEMS are reaching the industrialization stage. Prototypes of integrated inductances and optical switches demonstrate very promising performances. The transition to the high volume production implies the development of Design For Manufacturability (DFM) tools featured to handle MEMS specific processes and related problems such as yield loss due to process dispersion. This paper presents an original statistical optimization method for yield enhancement. The corresponding algorithm is currently developed by MEMSCAP and LIRMM, based on response variability minimization.

Citation Download Citation

Flavien Delauche, Bachar Affour, and Christian Dufaza "Parametric yield optimization of MEMS", Proc. SPIE 4755, Design, Test, Integration, and Packaging of MEMS/MOEMS 2002, (19 April 2002); https://doi.org/10.1117/12.462802

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