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13 September 2002 Ablation of PMMA, PTFE, and Si by soft x-rays emitted from hot dense plasma
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Proceedings Volume 4760, High-Power Laser Ablation IV; (2002)
Event: International Symposium on High-Power Laser Ablation 2002, 2002, Taos, New Mexico, United States
The efficiency and threshold of ablation of polymethylmethacrylate (PMMA), polytetrafluoroethylene (PTFE), and monocrystalline silicon by single pulses of soft x-rays emitted from Z-pinch, plasma-focus, and laser-produced plasmas were investigated. The Z-pinch was driven by the S-300 pulsed-power machine (Kurchatov Institute, Moscow) and the plasma focus was realized in the PF-1000 machine (Institute of Plasma Physics and Laser Microfusion, Warsaw). Higher temperature plasma than with the discharge plasmas was obtained by focusing the near-infrared beam from the PALS high-power iodine laser system (Czech Academy of Sciences, Prague) on the surface of a metallic slab target. The role of nonthermal processes in x-ray ablation was evaluated. Possible ways to use x-ray ablation for micromachining are discussed.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Libor Juha, Josef Krasa, A. R. Praeg, A. Cejnarova, Dagmar Chvostova, J. Kravarik, P. Kubes, Yu. L. Bakshaev, A. S. Chernenko, V. D. Korolev, V. I. Tumanov, M. I. Ivanov, Marek Scholz, Leszek Ryc, Krzysztof Tomaszewski, R. Viskup, Frederick P. Boody, and Jarmila Kodymova "Ablation of PMMA, PTFE, and Si by soft x-rays emitted from hot dense plasma", Proc. SPIE 4760, High-Power Laser Ablation IV, (13 September 2002);

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