13 September 2002 Laser ablation of a triazene polymer studied by ns-interferometry and shadowgraphy
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Proceedings Volume 4760, High-Power Laser Ablation IV; (2002) https://doi.org/10.1117/12.482093
Event: International Symposium on High-Power Laser Ablation 2002, 2002, Taos, New Mexico, United States
Abstract
Nanosecond-interferometry and shadowgraphy is used to observe the dynamic behavior of the etching process during and after the irradiation pulse. Commercially available polymers exhibit quite often poor laser ablation properties for irradiation wavelengths >=248nm. At these wavelengths the absorption is due to the quite photostable aromatic groups. A photolabile triazene polymer was selected to compare the influence of a photolabile group on the laser ablation process. The photochemical active triazene reveals a strong absorption band at 332 nm and is responsible for the observed high etch rates and the low threshold for 308 nm irradiation. The absorption coefficients at 193 nm and at 308 nm are comparable, allowing to study the influence of the different absorption sites by ns-interferometry and shadowgraphy measures. The etching of the triazene polymer starts and ends with the laser beam. No surface swelling, which is assigned to photothermal ablation, is detected for fluences above the threshold of the ablation. The expansion of the laser ablation induced shockwave was measured for the photolabile triazene polymer and the photostable polyimide. The speed of the shockwave increases with fluence and is higher for irradiation with 193 nm than for 308 nm. A shockwave with equal or higher velocity is observed for the triazene polymer than for the polyimide.
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Marc Hauer, David J. Funk, Thomas Lippert, Alexander J. Wokaun, "Laser ablation of a triazene polymer studied by ns-interferometry and shadowgraphy", Proc. SPIE 4760, High-Power Laser Ablation IV, (13 September 2002); doi: 10.1117/12.482093; https://doi.org/10.1117/12.482093
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