Particulates in pulsed laser deposition: formation mechanisms and possible approaches to their elimination

Ion N. Mihailescu; Valentin S. Teodorescu; Eniko Gyorgy; Carmen Ristoscu; R. Cristescu

doi:10.1117/12.478666

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9 August 2002 Particulates in pulsed laser deposition: formation mechanisms and possible approaches to their elimination

Ion N. Mihailescu, Valentin S. Teodorescu, Eniko Gyorgy, Carmen Ristoscu, R. Cristescu

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Proceedings Volume 4762, ALT'01 International Conference on Advanced Laser Technologies; (2002) https://doi.org/10.1117/12.478666
Event: International Conference on: Advanced Laser Technologies (ALT'01), 2001, Constanta, Romania

Abstract

Thin films deposited by pulsed laser deposition or reactive pulsed laser deposition are of interest in many key technological applications. However, the main shortcoming remains the presence on their surfaces and inside their volume of particles with various shapes and dimensions. We studied the possible formation and deposition mechanisms in different laser - target material - ambient gas configurations. Our experimental results as well as numerical simulations showed, that the origin of the particulates depends on the specific irradiation conditions, target and/or ambient gas nature and pressure. Therefore, the experimental conditions required for the decreasing of the particulates density or, if possible, for their complete elimination can be optimized for any particular case only. Nevertheless, a major conclusion of our investigations is that an important approach for the decrease of the particulates density, is to avoid the presence of liquid substance within the laser irradiation field.

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Ion N. Mihailescu, Valentin S. Teodorescu, Eniko Gyorgy, Carmen Ristoscu, and R. Cristescu "Particulates in pulsed laser deposition: formation mechanisms and possible approaches to their elimination", Proc. SPIE 4762, ALT'01 International Conference on Advanced Laser Technologies, (9 August 2002); https://doi.org/10.1117/12.478666

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