9 August 2002 Plume reflection in pulsed laser deposition
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Proceedings Volume 4762, ALT'01 International Conference on Advanced Laser Technologies; (2002) https://doi.org/10.1117/12.478638
Event: International Conference on: Advanced Laser Technologies (ALT'01), 2001, Constanta, Romania
Abstract
Plume reflection has been studied as a possibility for depositing on a direction perpendicular to target, convenient for manipulation of big size substrates and for avoiding the presence of droplets on film surface. Plume behaviour during reflection on a 45 degree(s) oriented plane surface has been monitored by a high- speed camera. Thin film, deposited by reflected plume, has been analysed by scanning electron microscopy (SEM) and atomic forces microscopy (AFM). Comparing with a standard deposition a 1-2 order of magnitude improvement for film roughness (RMS) has been noticed at the expense of one order of magnitude diminuation of deposition rate. The results have shown significant dependencies of film thickness and surface quality on plume reflection angle. Some aspects of big particles movement in deposition process are also presented.
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Aurelian Marcu, Aurelian Marcu, Constantin Grigoriu, Constantin Grigoriu, Weihua Jiang, Weihua Jiang, Kiyoshi Yatsui, Kiyoshi Yatsui, } "Plume reflection in pulsed laser deposition", Proc. SPIE 4762, ALT'01 International Conference on Advanced Laser Technologies, (9 August 2002); doi: 10.1117/12.478638; https://doi.org/10.1117/12.478638
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