Thin film tin oxide chemical sensors created by laser CVD and PLD techniques

Antonino Santoni; Jan Lancok; Michele Pensa; Filip Vyslouzil; Miroslav Jelinek; Ivano Menicucci; Vladimir Myslik

doi:10.1117/12.478625

9 August 2002 Thin film tin oxide chemical sensors created by laser CVD and PLD techniques

Antonino Santoni, Jan Lancok, Michele Pensa, Filip Vyslouzil, Miroslav Jelinek, Ivano Menicucci, Vladimir Myslik

Proceedings Volume 4762, ALT'01 International Conference on Advanced Laser Technologies; (2002) https://doi.org/10.1117/12.478625
Event: International Conference on: Advanced Laser Technologies (ALT'01), 2001, Constanta, Romania

Abstract

Tin oxide thin films based chemical sensors have been developed by means of laser induced chemical vapor deposition (L-CVD) and pulsed laser deposition (PLD) methods. The chemical composition of sensors was studied by XPS. By these two methods the tin oxide films were deposited at identical chemical chips and the sensitivity to hydrogen was measured and compared. An improvement of the sensitivity by using noble metal catalysts was observed. In addition, the possibility of detection Co, CH₄, SO₂, NO₂ and N₂O gasses on the films deposited by L-CVD technique and to alcohol vapor on the films deposed by PLD was studied.

Citation Download Citation

Antonino Santoni, Jan Lancok, Michele Pensa, Filip Vyslouzil, Miroslav Jelinek, Ivano Menicucci, and Vladimir Myslik "Thin film tin oxide chemical sensors created by laser CVD and PLD techniques", Proc. SPIE 4762, ALT'01 International Conference on Advanced Laser Technologies, (9 August 2002); https://doi.org/10.1117/12.478625

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