Paper
16 August 2002 Calibration of test reticles for qualification of imaging properties of microlithographic projection lenses
Wolfgang Haessler-Grohne, K Hahm, Werner Mirande, Harald Bosse, Michael Arnz
Author Affiliations +
Proceedings Volume 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2002) https://doi.org/10.1117/12.479346
Event: 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components, 2002, Munich-Unterhaching, Germany
Abstract
We report on investigations and calibrations of chrome on quartz 5' test reticles with periodic line structures which are applied for qualification of optical performance of microlithographic lenses. The measurements are focused on the precise determination of the line-to-space ratio of the test grid structures which is a necessary input information for the objective lens qualification procedure applied. Calibrations of linewidths and line-to-space ratios of the test structures with nominal CD values between 280 nm and 600 nm are mainly performed with a special low-voltage scanning electron microscope (SEM) supported by optical transmission microscopy calibrations on a small number of all test structures to be measured. The requirements on the measurement uncertainties of the line-to-space ratios are about 5%. In addition to the CD calibrations, investigations were started to estimate the influence of e-beam induced carbon deposition on the mask on the objective lens imaging properties.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wolfgang Haessler-Grohne, K Hahm, Werner Mirande, Harald Bosse, and Michael Arnz "Calibration of test reticles for qualification of imaging properties of microlithographic projection lenses", Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); https://doi.org/10.1117/12.479346
Lens.org Logo
CITATIONS
Cited by 4 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Calibration

Reticles

Scanning electron microscopy

Chromium

Optical microscopy

Lenses

Contamination

RELATED CONTENT


Back to Top