16 August 2002 Cleaning of low thermal expansion materials for low-defect EUVL mask substrates
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Proceedings Volume 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2002) https://doi.org/10.1117/12.479359
Event: 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components, 2002, Munich-Unterhaching, Germany
Abstract
First tests for cleaning Zerodur were accomplished. Because there are only a few cleaning methods suitable for the removal of small particles down to 50 nm we have investigated the behaviour of Zerodur in DI water and aqueous solutions.
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Eva Krueger-Velthusen, Falk Friemel, Lutz Aschke, Frank Lenzen, "Cleaning of low thermal expansion materials for low-defect EUVL mask substrates", Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); doi: 10.1117/12.479359; https://doi.org/10.1117/12.479359
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