16 August 2002 Defect inspection and repair reticle (DIRRT) design for the 100-nm and sub-100-nm technology nodes
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Proceedings Volume 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2002) https://doi.org/10.1117/12.479340
Event: 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components, 2002, Munich-Unterhaching, Germany
Abstract
Since pattern transfer is done via photomasks, they are critical to any process development. As a rule of thumb photomask development must keep I 8 months ahead of the wafer development pace in order that chipmakers meet the ITRS technology roadmap. This roadmap has been difficult to follow for the mask industry. While Lithography toolmakers have been successful in implementing technology changes to enhance resolution and maintain process enhancements with Optical Proximity Corrections (OPC) and Phase Shift Masks (PSM). The mask equipment industry has been slow to implement a technology switch due to its size and technical risks involved (1). Inspection and Repair of defects, to a mask manufacturer, are critical steps to the disposition of advanced photo masks. Masks that have gone through many critical processing steps or have been damaged in a production facility can most of the time be brought "back into specification" by verification inspection and repair thus enhancing yields which help to reduce cost of ownership. Yields in manufacturing can be increased by increasing productivity and equipment capability. Thus test mask are an integral part of tool development, monitoring, evaluation and acceptance. The design of the mask must have features sizes and layouts that are relevant to the tool under test or development. In this work our goal was to create a design that can be used for development and evaluation of inspection and repair tools for the I OOnm and sub I OOnm technology nodes.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nishrin Kachwala, Nishrin Kachwala, Klaus Eisner, Klaus Eisner, } "Defect inspection and repair reticle (DIRRT) design for the 100-nm and sub-100-nm technology nodes", Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); doi: 10.1117/12.479340; https://doi.org/10.1117/12.479340
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