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16 August 2002 Environmental monitoring system
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Proceedings Volume 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2002) https://doi.org/10.1117/12.479345
Event: 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components, 2002, Munich-Unterhaching, Germany
Abstract
Taking the challenge of Moore's Law production of lCs crosses the lOOnm borderline for gate lengths. The feature size and the ultra large scale integration are not yet limited by physics but by the performance of the manufacturing systems. The capability of i.e. e-beam mask writers is determined to an increasing extent by environmental influences. Achieving high-level productivity measuring and analysis of these disturbances, and thereby the quality of the site, is taking on ever more significance. Taking the advantage of the monitoring data, future pattern fidelity requirements can be obtained by implementing both passive and active cancelling methods where needed. Although semiconductor production takes place in well controlled cleanrooms, data of several variables are not acquired permanently. In this paper we present within the framework of a new 50kV mask writer installation the benefit of an environmental monitoring system that is capable of observing magnetic field fluctuations and feedback its measurement results to an active magnetic cancellation. Additionally floor vibration data are acquired by this tool.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gernot Goedl, Dirk Loeffelmacher, Timo Wandel, Gisbert Gralla, and Andreas Greiner "Environmental monitoring system", Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); https://doi.org/10.1117/12.479345
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