16 August 2002 High-precision mask repair using nanomachining
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Proceedings Volume 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2002) https://doi.org/10.1117/12.479356
Event: 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components, 2002, Munich-Unterhaching, Germany
Abstract
Nanomachining has recently been introduced as a new option for the repair of photomasks. The RAVE nm1300 system is a high precision system for subtractive removal of opaque mask defects. The first such system was installed at the Infineon Mask House in Munich, Germany. This paper presents the results of the acceptance testing. Programmed pattern defects on binary chrome on glass masks, alternating phase shifting masks and both 248nm and 193nm halftone phase shifting masks were used for these tests. Some examples of carbon patch trimming, sequential defect removing as well as repairing of 'non-removable' particles and irregularly shaped quartz bump defects demonstrate the unique capabilities of the tool.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Martin Verbeek, Martin Verbeek, Roy White, Roy White, Marty Klos, Marty Klos, } "High-precision mask repair using nanomachining", Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); doi: 10.1117/12.479356; https://doi.org/10.1117/12.479356
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