16 August 2002 Inspection of alternating PSM reticles using UV-based 365-nm reticle inspection tool
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Proceedings Volume 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2002) https://doi.org/10.1117/12.479352
Event: 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components, 2002, Munich-Unterhaching, Germany
Abstract
The paper presents results of a thorough study using the UV- based die-to-database mask inspection system ARIS100i for the inspection of alternating phase shifting masks (AAPSM) designed for KrF (248nm) technology. A specifically designed test mask was used to investigate sensitivity limitations of the i-line tool. Main focus is on phase errors, which were treated as a function of defect size, phase, and mask location.
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Anja Rosenbusch, Anja Rosenbusch, Michael M. Har-zvi, Michael M. Har-zvi, Gidon Gottlib, Gidon Gottlib, } "Inspection of alternating PSM reticles using UV-based 365-nm reticle inspection tool", Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); doi: 10.1117/12.479352; https://doi.org/10.1117/12.479352
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