Recent progress of low-energy e-beam proximity projection lithography (LEEPL) with B-tool development

Nobuo Shimazu; Hiroshi Nozue; Akihiro Endo; Akira Higuchi; T. Ise; Toyoharu Fukui; N. Yasumitsu; Tsutomu Miyatake; Norimiti Anazawa

doi:10.1117/12.479360

16 August 2002 Recent progress of low-energy e-beam proximity projection lithography (LEEPL) with β-tool development

Nobuo Shimazu, Hiroshi Nozue, Akihiro Endo, Akira Higuchi, T. Ise, Toyoharu Fukui, N. Yasumitsu, Tsutomu Miyatake, Norimiti Anazawa

Author Affiliations +

Proceedings Volume 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2002) https://doi.org/10.1117/12.479360
Event: 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components, 2002, Munich-Unterhaching, Germany

Abstract

Scniiconductor industry currently faces double-hold pains. One is the record-breaking semiconductor depression brought by the IT bubble collapse in the United States, and another is a brick wall called "Lithography Crisis" which stands in front of the technological progress. The former is that no growth of semiconductor market can be anticipated except household electric appliances because of the surplus of the optical communication infrastructure in the United States and sales reduction ofpersonai computer and cellular phone. The latter is that no cost effective solution can be found for next generation lithography, which has been searched for in a long time. Even in the semiconductor market of household electricity appliance, small or middle quantity production in multiple kinds is required to be extremely low cost. it is the new lithography called "LEEPL" (Low Energy Electron Beam Proximity Projection Lithography) that challenges to solve these cost issues. Thanks for simple tool configuration and small niask pattern area, LEEPL promises both tool and mask to be low cost.

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Nobuo Shimazu, Hiroshi Nozue, Akihiro Endo, Akira Higuchi, T. Ise, Toyoharu Fukui, N. Yasumitsu, Tsutomu Miyatake, and Norimiti Anazawa "Recent progress of low-energy e-beam proximity projection lithography (LEEPL) with β-tool development", Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); https://doi.org/10.1117/12.479360

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KEYWORDS

Charged-particle lithography

Photomasks

Semiconducting wafers

Electron beam lithography

Semiconductors

Lithography

Projection lithography

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