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30 July 2002 Absorbed-dose distribution of the secondary electrons near an x-ray microbeam
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Proceedings Volume 4765, International Conference on X-ray and Neutron Capillary Optics; (2002) https://doi.org/10.1117/12.489752
Event: International Conference on X-ray and Neutron Capillary Optics, 2001, Zvenigorod, Russian Federation
Abstract
Dose distributions of the secondary electrons were calcualted by Monte Carlo code EGS4 in water nera an infinitesimal area photon microbeam. The photon eneryg was from 10 to 100 keV, the radial resolution was 2 μm and the statistical error was from 0.1 to 1-2 percent depending on the calculation point. The Compton recoil electron and photoelectron dose fractions were separated from the dose profiles and fitted by simple analytical functions.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vladimir N. Vasiliev "Absorbed-dose distribution of the secondary electrons near an x-ray microbeam", Proc. SPIE 4765, International Conference on X-ray and Neutron Capillary Optics, (30 July 2002); https://doi.org/10.1117/12.489752
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