Some metrological issues in optical full-field techniques

Yves Surrel

doi:10.1117/12.472222

20 June 2002 Some metrological issues in optical full-field techniques

Yves Surrel

Proceedings Volume 4777, Interferometry XI: Techniques and Analysis; (2002) https://doi.org/10.1117/12.472222
Event: International Symposium on Optical Science and Technology, 2002, Seattle, WA, United States

Abstract

In this paper, we recall some basic concepts and the vocabulary of metrology. We propose some terms which today are not present in the terminology recommended by ISO. We address also the data post-processing, in particular spatial smoothing that usually decreases a lot the spatial resolution. We recommend to separate in the analysis what we call the phase sensor and the phase-to-measurand mapping. In some cases, the larger part of the uncertainty comes from the parameters which are present in this mapping.

Citation Download Citation

Yves Surrel "Some metrological issues in optical full-field techniques", Proc. SPIE 4777, Interferometry XI: Techniques and Analysis, (20 June 2002); https://doi.org/10.1117/12.472222

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