Heat stability of Mo/Si multilayers inserted with silicon oxide layers

Masahiko Ishino; Osamu Yoda; Kazuo Sano; Masato Koike

doi:10.1117/12.451346

24 December 2002 Heat stability of Mo/Si multilayers inserted with silicon oxide layers

Masahiko Ishino, Osamu Yoda, Kazuo Sano, Masato Koike

Proceedings Volume 4782, X-Ray Mirrors, Crystals, and Multilayers II; (2002) https://doi.org/10.1117/12.451346
Event: International Symposium on Optical Science and Technology, 2002, Seattle, WA, United States

Abstract

The Mo/Si multilayers inserted with the SiO₂ layers with 2.0 nm in thickness have been proven to be thermally more stable than the conventional Mo/Si multilayer. The Mo/Si/SiO₂ multilayer inserted with the SiO₂ layers at the Mo-on-Si interfaces had a relatively high soft X-ray reflectivity even after annealing at 400°C. The Mo/SiO₂/Si/SiO₂ multilayer was structurally the most stable against annealing but the soft X-ray reflectivity of this multilayer was quite small because of the absorption of X-rays by oxygen. To minimize the deterioration of the soft X-ray reflectivity of the Mo/SiO₂/Si/SiO₂multilayer with keeping the high heat stability, the optimum thicknesses of the inserted SiO₂ layers have been investigated. We have found that the Mo/SiO₂/Si/SiO₂ multilayer having asymmetric SiO₂ layer thicknesses at the Si-on-Mo interface (0.5 nm) and at the Mo-on-Si interface (1.5 nm) has thermally the most stable structure and maintains a high soft X-ray reflectivity after annealing.

Citation Download Citation

Masahiko Ishino, Osamu Yoda, Kazuo Sano, and Masato Koike "Heat stability of Mo/Si multilayers inserted with silicon oxide layers", Proc. SPIE 4782, X-Ray Mirrors, Crystals, and Multilayers II, (24 December 2002); https://doi.org/10.1117/12.451346

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