24 December 2002 Submicron focusing of hard x-ray beam by elliptically figured mirrors for scanning x-ray microscopy
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Abstract
Elliptical mirrors for X-ray microfocusing were manufactured using the new fabrication methods of elastic emission machining (EEM) and plasma chemical vaporization machining (CVM). Surface profiles measured with stitching interferometry showed a maximum deviation around the ideal figure of about 5nm in peak-to-valley. The mirror showed nearly diffraction-limited focusing performance, with a 200 nm line width at the focus. Wave-optical calculation, taking the measured surface profile into consideration, well reproduced the measured focusing properties both at the beam waist and around the beam waist. In addition, two-dimensional focusing unit using K-B mirror arrangement was also developed and evaluated to have about 200 × 200 nm2 focusing performance.
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Yuzo Mori, Kazuto Yamauchi, Kazuya Yamamura, Hidekazu Mimura, Yasuhisa Sano, Akira Saito, Kazumasa Ueno, Katsuyoshi Endo, Alexei Souvorov, Makina Yabashi, Kenji Tamasaku, Tetsuya Ishikawa, "Submicron focusing of hard x-ray beam by elliptically figured mirrors for scanning x-ray microscopy", Proc. SPIE 4782, X-Ray Mirrors, Crystals, and Multilayers II, (24 December 2002); doi: 10.1117/12.453754; https://doi.org/10.1117/12.453754
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