24 December 2002 Submicron focusing of hard x-ray beam by elliptically figured mirrors for scanning x-ray microscopy
Author Affiliations +
Elliptical mirrors for X-ray microfocusing were manufactured using the new fabrication methods of elastic emission machining (EEM) and plasma chemical vaporization machining (CVM). Surface profiles measured with stitching interferometry showed a maximum deviation around the ideal figure of about 5nm in peak-to-valley. The mirror showed nearly diffraction-limited focusing performance, with a 200 nm line width at the focus. Wave-optical calculation, taking the measured surface profile into consideration, well reproduced the measured focusing properties both at the beam waist and around the beam waist. In addition, two-dimensional focusing unit using K-B mirror arrangement was also developed and evaluated to have about 200 × 200 nm2 focusing performance.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuzo Mori, Yuzo Mori, Kazuto Yamauchi, Kazuto Yamauchi, Kazuya Yamamura, Kazuya Yamamura, Hidekazu Mimura, Hidekazu Mimura, Yasuhisa Sano, Yasuhisa Sano, Akira Saito, Akira Saito, Kazumasa Ueno, Kazumasa Ueno, Katsuyoshi Endo, Katsuyoshi Endo, Alexei Souvorov, Alexei Souvorov, Makina Yabashi, Makina Yabashi, Kenji Tamasaku, Kenji Tamasaku, Tetsuya Ishikawa, Tetsuya Ishikawa, } "Submicron focusing of hard x-ray beam by elliptically figured mirrors for scanning x-ray microscopy", Proc. SPIE 4782, X-Ray Mirrors, Crystals, and Multilayers II, (24 December 2002); doi: 10.1117/12.453754; https://doi.org/10.1117/12.453754

Back to Top