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24 December 2002 Wave-optical analysis of submicron focus of hard x-ray beams by reflective optics
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Abstract
Focusing methods using mirror optics are intensively studied in the field of X-ray microscopy because mirror optics has useful features such as high photon efficiency and no chromatic aberrations. Employing a wave-optical method, we investigated the relationship between the natures of figure errors on the mirror surface and optics performances such as sizes, intensities and satellite peak structures of the focused X-ray beam. We also evaluated uniformity of intensity in the spherically diverging beam from the focal point as a point source. Obtained results showed unprecedented degrees of surface figure accuracy such as higher than 1nm in all over the spatial wavelength range longer than 0.5mm was required to realize nearly diffraction-limited focusing including satellite structures and intensity flatness at the spherically diverging wavefront.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kazuto Yamauchi, Kazuya Yamamura, Hidekazu Mimura, Yasuhisa Sano, Akira Saito, Masahiko Kanaoka, Katsuyoshi Endo, Alexei Souvorov, Makina Yabashi, Kenji Tamasaku, Tetsuya Ishikawa, and Yuzo Mori "Wave-optical analysis of submicron focus of hard x-ray beams by reflective optics", Proc. SPIE 4782, X-Ray Mirrors, Crystals, and Multilayers II, (24 December 2002); https://doi.org/10.1117/12.453752
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