Following successful experience using photolithography and high aspect ratio reactive ion etching (RIE) to produce dynamically bent x-ray sagittal focusing crystals, we report on incorporating this optic in a novel high flux, narrow bandwidth, energy scanning monochromator for bend magnet synchrotron radiation. We describe the mono, several modes of operation, and our experience using it. Deep RIE has great utility for the manufacture, in silicon, of mechanical devices with feature as small as a few microns, however aberration free Bragg diffraction focusing requires uniformity in etch depth over large areas. To improve optical performance in terms of minimum focus spot size and maximum x-ray throughput, we are developing "second generation" focusing crystals based on a composite structure concept. We describe some of this new work and suggest areas of application.