A new hard x-ray diffractometer (100 to 400 keV) for bulk crystalline analysis: applications for nondestructive investigation

Bernard Hamelin; Pierre Bastie

doi:10.1117/12.451609

26 November 2002 A new hard x-ray diffractometer (100-400 keV) for bulk crystalline analysis: applications for nondestructive investigation

Bernard Hamelin, Pierre Bastie

Author Affiliations +

Proceedings Volume 4786, Penetrating Radiation Systems and Applications IV; (2002) https://doi.org/10.1117/12.451609
Event: International Symposium on Optical Science and Technology, 2002, Seattle, WA, United States

Abstract

The characterization in the bulk of crystalline thick materials (thickness: several cm) can be performed up to now by using high energy X-Ray sources (gamma ray diffractometers or high energy beamlines of synchrotron facilities) or with neutron beams. The Institut Laue-Langevin has developed and built in collaboration with the Laboratoire de Spectrométrie Physique, a new instrument using the continuous high energy X-ray spectrum (100 - 400 keV) delivered by a high voltage, fine focus X-ray generator, previously used for industrial radiography. This article describes the principle of this new diffractometer and presents an overview of the main applications in the field of non destructive crystalline characterization, for both physic researches and industrial applications.

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Bernard Hamelin and Pierre Bastie "A new hard x-ray diffractometer (100-400 keV) for bulk crystalline analysis: applications for nondestructive investigation", Proc. SPIE 4786, Penetrating Radiation Systems and Applications IV, (26 November 2002); https://doi.org/10.1117/12.451609

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