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15 October 1984 Application Of Electron - Optical Instruments For Measuring Small Pattern Features In Microlithography
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Proceedings Volume 0480, Integrated Circuit Metrology II; (1984) https://doi.org/10.1117/12.943056
Event: 1984 Technical Symposium East, 1984, Arlington, United States
Abstract
The fabrication of microelectronic components calls for efficient inspection instruments for checking the dimensional fidelity of micropatterns on masks and semiconductor wafers. The task, in particular, is to measure feature sizes from some microns down to 0,1μm and distances between line edges up to 150 mm. For solving this tasks electron microscopes are advantageous used. Recently a new precision measuring instrument has been developed by Jenoptik GmbH Jena: the ZRM 20 Electron-Beam Measuring and Inspection System. In the following a short description of the instrument will be given, in particular, of such functional subsystems, which determine the prerequisite to a high measuring accuracy and measuring speed.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Reiner Plontke "Application Of Electron - Optical Instruments For Measuring Small Pattern Features In Microlithography", Proc. SPIE 0480, Integrated Circuit Metrology II, (15 October 1984); doi: 10.1117/12.943056; https://doi.org/10.1117/12.943056
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