19 November 2003 Glass waveguides obtained by sputtering of a photosensitive glass target
Author Affiliations +
Proceedings Volume 4829, 19th Congress of the International Commission for Optics: Optics for the Quality of Life; (2003) https://doi.org/10.1117/12.525857
Event: 19th Congress of the International Commission for Optics: Optics for the Quality of Life, 2002, Florence, Italy
Abstract
RF sputtering of an amorphous photosensitive target at different deposition temperature and time conditions was performed in order to obtain thin film planar waveguides for telecom applications. Silica glass was used as a substrate, the chosen target was for the first time a photosensitive SiO2:GeO2:Na2O glass and the process was carried out under Ar atmosphere. The so-obtained thin films were tested in terms of composition, microstructure and optical properties. A planar waveguide was obtained at room temperature, with a refractive index of 1.5707 at a measurement wavelength of 1553 nm, with respect to a refractive index value of the substrate of 1.45.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Daniel Milanese, Daniel Milanese, Monica Ferraris, Monica Ferraris, C. Fabrizio Pirri, C. Fabrizio Pirri, } "Glass waveguides obtained by sputtering of a photosensitive glass target", Proc. SPIE 4829, 19th Congress of the International Commission for Optics: Optics for the Quality of Life, (19 November 2003); doi: 10.1117/12.525857; https://doi.org/10.1117/12.525857
PROCEEDINGS
2 PAGES


SHARE
Back to Top