19 November 2003 Lateral shearing interferometer for measuring refractive index of silicon
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Proceedings Volume 4829, 19th Congress of the International Commission for Optics: Optics for the Quality of Life; (2003) https://doi.org/10.1117/12.526895
Event: 19th Congress of the International Commission for Optics: Optics for the Quality of Life, 2002, Florence, Italy
Abstract
A simple lateral shearing interferometer is proposed for measuring refractive index of thin parallel plate silicon sample. The rotating sample works as lateral shearing element. As the sample rotates a continuous lateral shearing is obtained owing to the change of the optical path difference (OPD) between the transmitted beam and that first reflected by the surface sample. The recorded interferometric signal is Fourier-transform analyzed and the phase change is determined as a function of the rotating angle. If the thickness of the silicon sample is known the method provides accurate measurement of the refractive index. (Summary only available)
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Giuseppe Coppola, Giuseppe Coppola, Pietro Ferraro, Pietro Ferraro, Sergio M. De Nicola, Sergio M. De Nicola, Mario Iodice, Mario Iodice, "Lateral shearing interferometer for measuring refractive index of silicon", Proc. SPIE 4829, 19th Congress of the International Commission for Optics: Optics for the Quality of Life, (19 November 2003); doi: 10.1117/12.526895; https://doi.org/10.1117/12.526895
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