19 November 2003 Novel method for optical characterization of thin films by spectrophotometric measurements
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Proceedings Volume 4829, 19th Congress of the International Commission for Optics: Optics for the Quality of Life; (2003) https://doi.org/10.1117/12.530008
Event: 19th Congress of the International Commission for Optics: Optics for the Quality of Life, 2002, Florence, Italy
Abstract
A correct determination of the refractive properties and thickness of the individual thin film materials is very important when designing interference filters. We introduce a new approach to this characterization, useful for the design of antireflection multilayer stacks in the visible spectrum, where materials with negligible absorption are used. This method allows to know uncertainty in both the thickness and refractive index determination in that measurement domain. When the model used in the calculations -- i.e., homogeneous, plano-parallel layers -- is no longer valid for a complete description of the actual layer, our method enables the user to detect up to which limit the samples show inhomogeneities and/or other features not considered in the spectrophotometric properties calculation.
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Alfonso Egio-Artal, Alfonso Egio-Artal, Pablo Fernandez-Hidalgo, Pablo Fernandez-Hidalgo, Oriol Conde-Font, Oriol Conde-Font, Toni Vilajuana-Mas, Toni Vilajuana-Mas, } "Novel method for optical characterization of thin films by spectrophotometric measurements", Proc. SPIE 4829, 19th Congress of the International Commission for Optics: Optics for the Quality of Life, (19 November 2003); doi: 10.1117/12.530008; https://doi.org/10.1117/12.530008
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