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19 February 2003 Athermal optical waveguide filter fabricated by short pulse laser irradiation
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Proceedings Volume 4830, Third International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.486530
Event: LAMP 2002: International Congress on Laser Advanced Materials Processing, 2002, Osaka, Japan
Abstract
Ge-SiO2 thin films with extremely high photosensitivity against excimer laser light were fabricated by plasma enhanced chemical vapor deposition method. Direct formation of channel waveguide was successfully confirmed only by irradiation with excimer laser through a Cr mask pattern, which was previously coated on the slab-waveguide by sputtering method. Bragg gratings with high diffraction efficiency were also printed in the waveguide by another laser irradiation through the phase mask. Channel waveguides with Bragg gratings, on the other hand, were fabricated on the glass ceramic substrates with negative thermal expansion coefficient. Doping of B2O3 to Ge-SiO2 glass film was effectively suppressed the temperature drift of the stop band (dλ/dT)of the grating. The dλ/dT attained in this study was 5pm/°C, which was less than ½ of those for commercially available waveguide gratings. The waveguides with gratings using the photosensitive oxide thin films should be a promising candidate for future low cost and reliable optical access network.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Junji Nishii, Kenji Kintaka, Yasushi Kawamoto, and Masahide Takahashi "Athermal optical waveguide filter fabricated by short pulse laser irradiation", Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003); https://doi.org/10.1117/12.486530
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