Athermal optical waveguide filter fabricated by short-pulse laser irradiation

Junji Nishii; Kenji Kintaka; Yasushi Kawamoto; Masahide Takahashi

doi:10.1117/12.486530

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19 February 2003 Athermal optical waveguide filter fabricated by short pulse laser irradiation

Junji Nishii, Kenji Kintaka, Yasushi Kawamoto, Masahide Takahashi

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Proceedings Volume 4830, Third International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.486530
Event: LAMP 2002: International Congress on Laser Advanced Materials Processing, 2002, Osaka, Japan

Abstract

Ge-SiO₂ thin films with extremely high photosensitivity against excimer laser light were fabricated by plasma enhanced chemical vapor deposition method. Direct formation of channel waveguide was successfully confirmed only by irradiation with excimer laser through a Cr mask pattern, which was previously coated on the slab-waveguide by sputtering method. Bragg gratings with high diffraction efficiency were also printed in the waveguide by another laser irradiation through the phase mask. Channel waveguides with Bragg gratings, on the other hand, were fabricated on the glass ceramic substrates with negative thermal expansion coefficient. Doping of B₂O₃ to Ge-SiO₂ glass film was effectively suppressed the temperature drift of the stop band (dλ/dT)of the grating. The dλ/dT attained in this study was 5pm/°C, which was less than ½ of those for commercially available waveguide gratings. The waveguides with gratings using the photosensitive oxide thin films should be a promising candidate for future low cost and reliable optical access network.

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Junji Nishii, Kenji Kintaka, Yasushi Kawamoto, and Masahide Takahashi "Athermal optical waveguide filter fabricated by short pulse laser irradiation", Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003); https://doi.org/10.1117/12.486530

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