Beamsplitting ZnSe diffractive optical element

Kenichi Kurisu; Takayuki Hirai; Toshihiko Ushiro; Keiji Fuse; Takeshi Okada; Keiji Ebata

doi:10.1117/12.486527

19 February 2003 Beam-splitting ZnSe diffractive optical element

Kenichi Kurisu, Takayuki Hirai, Toshihiko Ushiro, Keiji Fuse, Takeshi Okada, Keiji Ebata

Proceedings Volume 4830, Third International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.486527
Event: LAMP 2002: International Congress on Laser Advanced Materials Processing, 2002, Osaka, Japan

Abstract

ZnSe Diffractive Optical Element (DOE) is one of the advanced optics which utilizes the optical diffraction phenomena by fabricating a micron order pattern on polished mirror-like surface of ZnSe polycrystal substrate. Various applications for a carbon dioxide (CO₂) laser material processing such as beam-splitting, beam-shaping and beam-homogenizing are available. The micro pattern of ZnSe DOE is fabricated by the photolithography and reactive ion etching (RIE) technique. Its optical property is highly dependent on the depth precision of microfabricated pattern. In RIE by using BCl3 as the etchant gas we have achieved an etching technique to maintain the smooth surface of the ZnSe polycrystal with minimal etching rate dependency on the crystal orientation of each crystal grain. The surface roughness is 2nm Ra before etching and 5 nm Ra after about 4 microns depth etching. This good roughness brings better depth precision. With these etching technique beam-splitting ZnSe DOE with less than 10% intensity uniformity of splitted beams is successfully obtained and it can be put to use for practical CO₂ laser hole drilling.

Citation Download Citation

Kenichi Kurisu, Takayuki Hirai, Toshihiko Ushiro, Keiji Fuse, Takeshi Okada, and Keiji Ebata "Beam-splitting ZnSe diffractive optical element", Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003); https://doi.org/10.1117/12.486527

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