19 February 2003 High-speed and efficient control of refractive index change of fused silica by multiwavelength excitation process using F2 and KrF excimer lasers
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Proceedings Volume 4830, Third International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.497735
Event: LAMP 2002: International Congress on Laser Advanced Materials Processing, 2002, Osaka, Japan
Abstract
A multiwavelength excitation process using F2 and KrF excimer lasers for high-efficiency and high-speed refractive index modification of fused silica is demonstrated. We find that this process is essentially superior to conventional single-wavelength F2 laser processing. The multiwavelength excitation process achieves twice of diffraction efficiency compared with that of single-wavelength F2 laser irradiation sample at the same number of total photons supplied to the sample. This high-speed and high-efficiency modification is realized within ±50 ns of the delay time of each laser beam irradiation. In addition, the refractive index change of the multiwavelength sample was increased to 8.2×10-3, which is 1.78 times larger than that of single-wavelength F2 laser irradiation sample at same irradiation time. This superiority of the wavelength excitation process is attributed to resonance photoionization-like process based on excited state absorption in fused silica.
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Kotaro Obata, Kotaro Obata, Koji Sugioka, Koji Sugioka, Tatsuya Kono, Tatsuya Kono, Hiroshi Takai, Hiroshi Takai, Koichi Toyoda, Koichi Toyoda, Katsumi Midorikawa, Katsumi Midorikawa, } "High-speed and efficient control of refractive index change of fused silica by multiwavelength excitation process using F2 and KrF excimer lasers", Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003); doi: 10.1117/12.497735; https://doi.org/10.1117/12.497735
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