19 February 2003 Time-resolved monitoring of ZnO plume by ArF laser ablation: influence of surrounding gas
Author Affiliations +
Proceedings Volume 4830, Third International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.486563
Event: LAMP 2002: International Congress on Laser Advanced Materials Processing, 2002, Osaka, Japan
Abstract
We have investigated dynamics of ablated species in ZnO plume under ArF excimer laser irradiation with emission imaging and spectroscopy, and discussed the effect of a surrounding inert gas. Surrounding He or Ar gas strongly cools down the plume and encourages aggregation of ablated species, which is visualized by second laser irradiation to the plume.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yoshizo Kawaguchi, Yoshizo Kawaguchi, Aiko Narazaki, Aiko Narazaki, Tadatake Sato, Tadatake Sato, Hiroyuki Niino, Hiroyuki Niino, } "Time-resolved monitoring of ZnO plume by ArF laser ablation: influence of surrounding gas", Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003); doi: 10.1117/12.486563; https://doi.org/10.1117/12.486563
PROCEEDINGS
6 PAGES


SHARE
Back to Top