19 February 2003 Toward nano-process applications with laser-cooled silicon atoms
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Proceedings Volume 4830, Third International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.486587
Event: LAMP 2002: International Congress on Laser Advanced Materials Processing, 2002, Osaka, Japan
Abstract
We have developed an all-solid-state 252nm coherent light source for laser cooling of silicon atoms with tow-stage highly efficient frequency conversions with external cavities. With the coherent light source, it is possible to manipulate the atomic motion of the silicon atoms towards nano-process applications. In this paper, deflection, collimation, and axial velocity selection of the silicon atomic beam with the coherent light source are discussed.
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Hiroshi Kumagai, Yuichi Asakawa, Katsumi Midorikawa, Minoru Obara, "Toward nano-process applications with laser-cooled silicon atoms", Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003); doi: 10.1117/12.486587; https://doi.org/10.1117/12.486587
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