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19 February 2003 Ultrafast laser microstructuring for x-ray optics
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Proceedings Volume 4830, Third International Symposium on Laser Precision Microfabrication; (2003)
Event: LAMP 2002: International Congress on Laser Advanced Materials Processing, 2002, Osaka, Japan
The ultrashort laser microstructuring of multilayer gratings for X-Ray optics is presented in this paper. A micromachining system operating with a KrF laser at 0.5 ps pulse duration and a high reduction ratio (÷30) optical projection system was used to etch grating structures on Si/Mo multilayer with lateral period of 1.5 m. Scanning Electron Microscopy, Atomic Force Microscopy and X-ray Reflectivity were used to characterize the microetched patterns. Gratings with over 100 lines of 0.8μm×700μm were fabrication at low laser fluences (<600mJ/cm2). The roughness of the grating was measured from 0.5 nm to 1 nm for the shallow grooves (depth=4-5nm). The X-Ray reflectivity measurements confirmed the well-preserved multilayer structure. The ω scans around the 1st Bragg maximum have shown diffraction peaks up to the 3rd order on both sides with positions corresponding to the grating period. The use of sub-picosecond laser pulses minimizes the thermal affected zone and enhances the quality of the etched features. The ultrashort laser micromachining is advantageous for the fabrication of high spatial resolution microstructures required in the X-Ray optics industry.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. G. Papazoglou, Alexandra Manousaki, I. Zergioti, Eva Majkova, Stefan Luby, and Costas Fotakis "Ultrafast laser microstructuring for x-ray optics", Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003);

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