23 December 2002 High NA projection lens design for exposure tools
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Proceedings Volume 4832, International Optical Design Conference 2002; (2002) https://doi.org/10.1117/12.486475
Event: International Optical Design Conference 2002, 2002, Tucson, AZ, United States
Abstract
In the history of the semiconductor industry, exposure tools have been improved in resolution. This paper describes how to increase NA of projection lens up to more than 0.7 without increasing lens diameter or deteriorating the aberrations.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Toshiro Ishiyama, Kotaro Yamaguchi, "High NA projection lens design for exposure tools", Proc. SPIE 4832, International Optical Design Conference 2002, (23 December 2002); doi: 10.1117/12.486475; https://doi.org/10.1117/12.486475
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