17 February 2003 Tunable thin film filters based on thermo-optic semiconductor films
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Proceedings Volume 4833, Applications of Photonic Technology 5; (2003) https://doi.org/10.1117/12.474383
Event: Applications of Photonic Technology 5, 2002, Quebec City, Canada
Abstract
Thermo-optic layers of thin film semiconductors are deposited by PEVCD to create thermally tunable bandpass filters for WDM optical networks. Amorphous semiconductor films, adapted from the solar cell and display industries, are the primary ingredient. Single-cavity tunable filters with FWHM=0.085 nm, >40 nm tuning range, and insertion losses 0.2-4 dB are demonstrated. Key enablers for this new family of index-tunable thin film devices are PECVD deposition, large internal temperature changes >400C, high conductivity polysilicon heater films, and extremely robust film adhesion. Possible applications include optical monitoring, add/drop multiplexing, dynamic gain equalization, and dispersion compensation.
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Lawrence H. Domash, Lawrence H. Domash, Eugene Y. Ma, Eugene Y. Ma, Nikolay Nemchuk, Nikolay Nemchuk, Adam Payne, Adam Payne, Ming Wu, Ming Wu, } "Tunable thin film filters based on thermo-optic semiconductor films", Proc. SPIE 4833, Applications of Photonic Technology 5, (17 February 2003); doi: 10.1117/12.474383; https://doi.org/10.1117/12.474383
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