30 January 2003 Fabrication of silicon grisms
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Proceedings Volume 4842, Specialized Optical Developments in Astronomy; (2003); doi: 10.1117/12.459460
Event: Astronomical Telescopes and Instrumentation, 2002, Waikoloa, Hawai'i, United States
Abstract
Silicon grisms are suitable optical devices that allow for a spectroscopic mode able to effectively complement the natural imaging mode of IR cameras, providing high spectral resolution (R>5000) in the near infrared. We present a review of the fabrication process aimed to produce IR grisms with high refractive index. Such devices are intended to implement a high resolution mode in the Near IR Camera-Spectrograph, NICS, the user instrument at the focal plane of the Italian national telescope Galileo. Litho masking and anisotropic etching techniques have been employed to get, firstly, silicon gratings of suitable size for astronomical use, then warm bonding techniques have been used to obtain the final grisms in echelle configuration. The results and the problems encountered in the bonding procedure are presented along with a future implementation of silicon grisms in space instrumentation.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fabrizio Vitali, Elena Cianci, Vittorio Foglietti, Dario Lorenzetti, "Fabrication of silicon grisms", Proc. SPIE 4842, Specialized Optical Developments in Astronomy, (30 January 2003); doi: 10.1117/12.459460; https://doi.org/10.1117/12.459460
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KEYWORDS
Silicon

Prisms

Spectral resolution

Infrared imaging

Surface finishing

Anisotropic etching

Cameras

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