Silicon grisms and immersion gratings produced by anisotropic etching: testing and analysis

Jasmina P. Marsh; Oleg A. Ershov; Daniel T. Jaffe

doi:10.1117/12.461759

5 March 2003 Silicon grisms and immersion gratings produced by anisotropic etching: testing and analysis

Jasmina P. Marsh, Oleg A. Ershov, Daniel T. Jaffe

Proceedings Volume 4850, IR Space Telescopes and Instruments; (2003) https://doi.org/10.1117/12.461759
Event: Astronomical Telescopes and Instrumentation, 2002, Waikoloa, Hawai'i, United States

Abstract

Because they can vastly reduce the required collimated beamsize at a given diffraction-limited resolution, silicon immersion gratings and grisms are an enabling technology for high resolution infrared spectroscopy from space and are highly useful in a range of ground-based and airborne instruments. We have used anistropic etching techniques to produce diffraction gratings on bulky silicon substrates. These devices can serve as high resolution grisms (when used in transmission), as coarse front-surface gratings, or as very high resolution immersion gratings. We have been able to produce devices with high optical efficiency by insuring that their entrance faces and groove surfaces are optically flat and that the groove positions are correct to within tolerance appropriate to the wavelength where the gratings will be used. We report here on testing and evaluation of high resolution Si gratings both in transmission (grism) and in reflection (immersion) mode.

Citation Download Citation

Jasmina P. Marsh, Oleg A. Ershov, and Daniel T. Jaffe "Silicon grisms and immersion gratings produced by anisotropic etching: testing and analysis", Proc. SPIE 4850, IR Space Telescopes and Instruments, (5 March 2003); https://doi.org/10.1117/12.461759

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