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26 February 2003 Laser micro-machining of waveguide devices for sub-mm and far IR interferometry and detector arrays
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Abstract
Laser induced, micro-chemical etching is a promising new technology that can be used to fabricate three dimensional structures many millimeters across with micrometer accuracy. Laser micromachining possesses a significant edge over more conventional techniques. It does not require the use of masks and is not confined to crystal planes. A non-contact process, it eliminates tool wear and vibration problems associated with classical milling machines. At the University of Arizona we have constructed the first such laser micromaching system optimized for the fabrication of THz and far IR waveguide and quasi-optical components. Our system can machine many millimeters across down to a few microns accuracy in a short time, with a remarkable surface finish. This paper presents the design, operation and performance of our system, and its applications to waveguide devices for sub millimeter and far IR interferometry.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christian Y. Drouet d'Aubigny, Christopher K. Walker, Dathon Golish, Mark R. Swain, Philip J. Dumont, and Peter R. Lawson "Laser micro-machining of waveguide devices for sub-mm and far IR interferometry and detector arrays", Proc. SPIE 4852, Interferometry in Space, (26 February 2003); https://doi.org/10.1117/12.460865
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