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26 February 2003 SIM external metrology beam launcher (QP) development
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Abstract
Visible interferometry at µarc-second accuracy requires measurement of the interferometric baseline length and orientation at picometer accuracy. The optical metrology instruments required for these interferometers must achieve accuracy on order of 1 to 10 picometers. This paper discusses the progress in the development of optical interferometers for use in distance measurement gauges with systematic errors below 100 picometers. The design is discussed as well as test methods and test results.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lawrence L. Ames, Robert Barrett, Raymond M. Bell Jr., Lawrence J. Dries, Kalyan Dutta, Peter G. Halverson, Buck Holmes, Eric T. Kvamme, David F. Leary, Patrick Perkins, Mark Scott, Timothy E. Van Eck, and Feng Zhao "SIM external metrology beam launcher (QP) development", Proc. SPIE 4852, Interferometry in Space, (26 February 2003); https://doi.org/10.1117/12.460946
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