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Integrating CD and Lithographic Process Window analysis with Mask Data Preparation for Subwavelength ICs
Analysis of the impact of reticle CD variations on the available process windows for a 100 nm CMOS process
PRIMADONNA: a system for automated defect disposition of production masks using wafer lithography simulation
High-performance 6-inch EUV mask blanks produced under real production conditions by ion-beam sputter deposition
Evaluation of the Capability of a Multibeam Confocal Inspection System for Inspection of EUVL Mask Blanks
Characterization of repairs to KrF 300mm wafer printability for 0.13μm design rule with attenuated phase-shifting mask