Application of chromeless phase lithography (CPL) masks in ArF lithography

Bryan S. Kasprowicz; Christopher J. Progler; Wei Wu; Will Conley; Lloyd C. Litt; Douglas J. Van Den Broeke; Kurt E. Wampler; Robert John Socha

doi:10.1117/12.468107

27 December 2002 Application of Chromeless Phase Lithography (CPL) masks in ArF lithography

Bryan S. Kasprowicz, Christopher J. Progler, Wei Wu, Will Conley, Lloyd C. Litt, Douglas J. Van Den Broeke, Kurt E. Wampler, Robert John Socha

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Proceedings Volume 4889, 22nd Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.468107
Event: Photomask Technology 2002, 2002, Monterey, CA, United States

Abstract

The challenges of low k1 lithography require unique solutions at all levels of the lithography process. Chromeless phase lithography (CPL) is a promising technique that uses a 2-beam imaging strategy and a unique OPC application for enhanced CD uniformity through pitch. It is particularly effective when combined with a high numerical aperture (NA) and off-axis illumination (OAI). In addition to its imaging benefits, CPL masks offer many advantages in the manufacturing of the mask over other approaches. The manufacturing strategy and methodology employed to fabricate CPL masks will be discussed. The technical challenges of mask production will also be highlighted. Application of CPL to production ArF images were characterized through simulations and experimental data demonstrating the capability of this technique to produce complex structures.

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Bryan S. Kasprowicz, Christopher J. Progler, Wei Wu, Will Conley, Lloyd C. Litt, Douglas J. Van Den Broeke, Kurt E. Wampler, and Robert John Socha "Application of Chromeless Phase Lithography (CPL) masks in ArF lithography", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); https://doi.org/10.1117/12.468107

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