27 December 2002 Back to square 9: a demonstration of 9" reticle capability
Author Affiliations +
Abstract
This work involved a demonstration of the infrastructure and the ability of mask-making equipment to produce 9 inch reticles. While the choices for this particular work made the timing and logistics long and complicated, we find that there currently exists adequate infrastructure to create 9 inch reticles and we have used this ability to produce several demonstration quality examples.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kevin D. Cummings, Kevin D. Cummings, Ludger U. Schneider-Stoermann, Ludger U. Schneider-Stoermann, Ute Buttgereit, Ute Buttgereit, Mathias Irmscher, Mathias Irmscher, Dietmar Mueller, Dietmar Mueller, Peter Hudek, Peter Hudek, Dirk Beyer, Dirk Beyer, Bernd Brendel, Bernd Brendel, John M. Whittey, John M. Whittey, Benjamin George Eynon, Benjamin George Eynon, Jason Harsch, Jason Harsch, Chris Constantine, Chris Constantine, Kirk Miller, Kirk Miller, } "Back to square 9: a demonstration of 9" reticle capability", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); doi: 10.1117/12.467495; https://doi.org/10.1117/12.467495
PROCEEDINGS
10 PAGES


SHARE
RELATED CONTENT


Back to Top