Author Affiliations +
Kevin D. Cummings,1 Ludger U. Schneider-Stoermann,2 Ute Buttgereit,2 Mathias Irmscher,3 Dietmar Mueller,3 Peter Hudek,4 Dirk Beyer,4 Bernd Brendel,4 John M. Whittey,4 Benjamin George Eynon Jr.,5 Jason Harsch,5 Chris Constantine,6 Kirk Miller7
1ASML (United States)
2Schott Lithotec AG (Germany)
3Institut fuer Mikroelektronik Stuttgart (Germany)
4Leica Microsystems Lithography GmbH (Germany)
5Photronics Inc. (United States)
6Unaxis USA, Inc. (United States)
7Veeco Instruments (United States)