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27 December 2002 Back to square 9: a demonstration of 9" reticle capability
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Abstract
This work involved a demonstration of the infrastructure and the ability of mask-making equipment to produce 9 inch reticles. While the choices for this particular work made the timing and logistics long and complicated, we find that there currently exists adequate infrastructure to create 9 inch reticles and we have used this ability to produce several demonstration quality examples.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kevin D. Cummings, Ludger U. Schneider-Stoermann, Ute Buttgereit, Mathias Irmscher, Dietmar Mueller, Peter Hudek, Dirk Beyer, Bernd Brendel, John M. Whittey, Benjamin George Eynon Jr., Jason Harsch, Chris Constantine, and Kirk Miller "Back to square 9: a demonstration of 9" reticle capability", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); https://doi.org/10.1117/12.467495
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