Laser PG performance for 100-nm photomasks

Mats Rosling; Andrzej Karawajczyk; Per Askebjer; Raoul Zerne; Allen M. Carroll; Robert Eklund; Hans Fosshaug; Torbjoern Sandstrom

doi:10.1117/12.468622

27 December 2002 Laser PG Performance for 100 nm Photomasks

Mats Rosling, Andrzej Karawajczyk, Per Askebjer, Raoul Zerne, Allen M. Carroll, Robert Eklund, Hans Fosshaug, Torbjoern Sandstrom

Author Affiliations +

Proceedings Volume 4889, 22nd Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.468622
Event: Photomask Technology 2002, 2002, Monterey, CA, United States

Abstract

The recently installed Sigma7100 laser pattern generator brings a new concept into photomask manufacturing. The spatial light modulator (SLM) technology enables 2D patterning using commercially available 248 nm lasers. This wavelength shift from the 413 nm wavelength of the Omega6000 scanning laser pattern generators facilitates the high resolution needed for 100 nm mask production. In addition, the partially coherence of the 2D patterning further enhances CD linearity and edge acuity. The rapidly increasing mask costs are partially attributed to increasing photomask writing times. These tend to increase as feature density increases with the roadmap, which is a challenge for any pattern generator with a limited number of writing beams. Instead, the SLM technology relies on the massive parallelism of one million micromirrors in combination with gray-scale control for fine addressing. A real-time FPGA-based data-rendering engine matches the speed. The result is pattern generation with high resolution at manageable mask writing times

Citation Download Citation

Mats Rosling, Andrzej Karawajczyk, Per Askebjer, Raoul Zerne, Allen M. Carroll, Robert Eklund, Hans Fosshaug, and Torbjoern Sandstrom "Laser PG Performance for 100 nm Photomasks", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); https://doi.org/10.1117/12.468622

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