27 December 2002 Line Edge Roughness Comparison Between Wet and Dry Etched Reticles
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Proceedings Volume 4889, 22nd Annual BACUS Symposium on Photomask Technology; (2002); doi: 10.1117/12.467246
Event: Photomask Technology 2002, 2002, Monterey, CA, United States
Abstract
We present a comparison of line edge roughness on wet and dry etched reticles manufactured at the same mask shop. These measurements were taken on a Leica LWM250, and compare identical features on both masks. A 30% improvement in line edge quality was seen on the dry etched plates. Data supporting these results is presented.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kunal N. Taravade, Robert C. Muller, Susan Erichsrud, "Line Edge Roughness Comparison Between Wet and Dry Etched Reticles", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); doi: 10.1117/12.467246; https://doi.org/10.1117/12.467246
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KEYWORDS
Platinum

Reticles

Etching

Line edge roughness

Dry etching

Wet etching

Photomasks

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