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27 December 2002 Manufacturability evaluation of model-based OPC masks
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Abstract
A systematic method for the model-based optical proximity correction in presented. This is called optical proximity effect reducing algorithm (OPERA) and has been implemented to TOPO, an in-house program for optical lithography simulations. Comparing simulational results as well as experimental results, we found that OPERA is not only suitable for shape restoration but also for resolution enhancement. However, the resulting optimized patterns have a high degree of complexity and this brought up a number of issues for mask manufacturing. First, data volume and exposure time were dramatically increased for conventional e-beam file formats. This was solved by using the MODE6 format that preserves data hierarchy. Second, due to excessive shot divisions, a variable-shaped beam machine could not finish the exposure process. A raster-scan beam machine successfully finished the exposure. Finally, a die-to-die inspection was performed but many false defects that do not affect wafer printing were defected. This will be solved by a new type of tool that inspects a mask by evaluating its aerial image.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sung-Hoon Jang, Sonny Y. Zinn, Won-Tai Ki, Ji-Hyun Choi, Chan-Uk Jeon, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn, Yong-Ho Oh, Jai-Cheol Lee, and Sungwoo Lim "Manufacturability evaluation of model-based OPC masks", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); https://doi.org/10.1117/12.468093
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