27 December 2002 Performance of Proximity Gap Suction Development (PGSD)
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Abstract
The loading effect is becoming a great issue in mask fabrication. To reduce CD error due to resist load, we have developed a developer based on a new concept, Proximity Gap Suction Development (PGSD), involving the use of a nozzle to spout developer and suck in dirty developer. In this paper, the performance of PGSD is reported.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hideaki Sakurai, Hideaki Sakurai, Masamitsu Itoh, Masamitsu Itoh, Yukihiko Esaki, Yukihiko Esaki, Kotaro Ooishi, Kotaro Ooishi, Kazuo Sakamoto, Kazuo Sakamoto, Mika Nakao, Mika Nakao, Toshiharu Nishimura, Toshiharu Nishimura, Hiroyuki Miyashita, Hiroyuki Miyashita, Naoya Hayashi, Naoya Hayashi, } "Performance of Proximity Gap Suction Development (PGSD)", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); doi: 10.1117/12.467297; https://doi.org/10.1117/12.467297
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