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27 December 2002 Resolution extensions in the Sigma 7000 imaging pattern generator
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Abstract
The first pattern generator, Sigma 7100, using the novel optical SLM (Spatial Light Modulator) technology is now shipping. This paper analyses the writing strategy, how the quality differs from that of a stepper/scanner, and some improvements in development for the next product, here called the SIGMA 7X. The improvements include higher NA, smaller grid size, optimized illumination for reduced proximity effects, and weak phase shifting. The use of embedded addition of corner enhancements is discussed. Finally there is a brief discussion of chrome as the absorber film in binary masks.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tor Sandstrom and Niklas Eriksson "Resolution extensions in the Sigma 7000 imaging pattern generator", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); https://doi.org/10.1117/12.468623
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